I. Application
Quartz materials for semiconductor and optical industries ( LCD optical mask substrate, lens and mirror, aerospace window, large aperture reflection grating).
II. Product Features
The synthetic quartz ingot is made with synthetic material by hydrogen and oxygen flame melting method.
Product feature is extremely high purity (total impurity content high UV transmittance (internal transmittance of 185nm reaches bubble level and low stress.
III. Product Type
IV. Typical Size
| Type | Shape | Size |
| PQ870 | Ingot/plate/ring | 300~450mm |
V. Physical and Chemical Properties
i. Mechanical and Thermal Properties
| Value | Remark | |
| Density g/cm3 | 2.2 | |
| Refractive Index | 1.46 | At 500nm |
| Softening Point ℃ | 1600 | η=107.6 |
| Annealing Point ℃ | 1080 | η=1013 |
| Strain Point ℃ | 980 | η=1014.5 |
ii. Impurity Value
| Na | K | Mg | Li | Ca | Fe | Al | Cu | |
| MaxValue | 0.05 | 0.02 | 0.01 | 0.01 | 0.03 | 0.02 | 0.1 | 0.01 |
iii. Optical Properties
